PPE Group

PPE Group This is the Product and Process Engineering Group at the department of Chemical Engineering of Delft University of Technology

Our paper on the separation of bio-particles for CTC applications in collaboration with Jorg Thoming’s group (in Univers...
17/07/2018

Our paper on the separation of bio-particles for CTC applications in collaboration with Jorg Thoming’s group (in University of Bremen) just published in Scientific Reports. Congrats to Georg, Shaurya, and Samir!

Article

Morgen wordt een dag voor sub-toppers, laatste paar km naar de top is gekkenwerk, kennelijk.
01/05/2018

Morgen wordt een dag voor sub-toppers, laatste paar km naar de top is gekkenwerk, kennelijk.

mardi 01/05/2018 à 15h24 | Faits divers - Justice Mont-Ventoux : 18 personnes bloquées à cause de pluies verglaçantes Par Doan Poirier Un petit groupe serait en train de rebrousser chemin tandis que le reste attend les secours. Photo V.S. 0 Aux alentours de 14 h, les sapeurs-pompiers ont été a...

Winterbandjes monteren en dan lukt het wel
06/04/2018

Winterbandjes monteren en dan lukt het wel

Paper on the slip behavior of DNA solution is published in BiomicrofluidisIn this paper, we investigate the slip behavio...
02/09/2017

Paper on the slip behavior of DNA solution is published in Biomicrofluidis
In this paper, we investigate the slip behavior of an entangled DNA solution at a molecular scale using a confocal microscope coupled to a microfluidic device. Congrats!

Despite the relevance and importance of slip, a fundamental understanding of the underlying molecular mechanisms of wall slip in polymer flow is still missing. In this work, we investigate the slip behavior of an entangled DNA solution at a molecular scale using a confocal microscope coupled to a mi...

Busy days for Durgesh Kawale, PhD DEF on 6/Sept, join us @ 14:30-16:00 ;)
30/08/2017

Busy days for Durgesh Kawale, PhD DEF on 6/Sept, join us @ 14:30-16:00 ;)

Dayinta and Lea’s paper has been published in Advances in Colloid and Interface Science. In this article, we focus on th...
08/05/2017

Dayinta and Lea’s paper has been published in Advances in Colloid and Interface Science. In this article, we focus on the effects of pulsed electric fields on lipid vesicles ranging from giant unilamellar vesicles (GUVs) to small unilamellar vesicles (SUVs), from both fundamental and applicative perspectives. Congrats to Dayinta and Lea!
http://www.sciencedirect.com/science/article/pii/S0001868617300921

16/12/2016

Shaurya and Aswin’s paper on unraveling the mechanism of “Neck" formation in Extensional Flow of Polymer is Published in Macromolecules.
In this paper, Shaurya and Aswin study and describe the conformation of polymer molecules during thinning and necking of polymeric droplets in an extensional flow provided by using microfluidics. We find that the individual polymer molecules suddenly stretch from their coiled conformation at the onset of necking. Congrats to Shaurya and Aswin for a very nice paper!
http://pubs.acs.org/doi/abs/10.1021/acs.macromol.6b01755

Molecular Processes Leading to “Necking” in Extensional Flow of Polymer Solutions: Using Microfluidics and Single DNA ImagingShaurya Sachdev, Aswin Muralidharan, and Pouyan E. Boukany* Department of Chemical Engineering, Delft University of Technology, 2629 HZ, Delft, The NetherlandsMacromolecules,…

Paper on atomic and molecular layer deposition published in Chemical Communications.In this paper, we present the recent...
15/12/2016

Paper on atomic and molecular layer deposition published in Chemical Communications.
In this paper, we present the recent developments in the fields of ALD and MLD with regard to the bottom-up synthesis of novel nanostructured materials. In particular, we provide for the first time a critical overview of the effects of the process conditions on the synthesis. Congratulations Hao and Fabio!

http://pubs.rsc.org/en/content/articlelanding/2016/cc/c6cc05568k #!divAbstract

Atomic layer deposition (ALD) is a gas-phase deposition technique that, by relying on self-terminating surface chemistry, enables the control of the amount of deposited material down to the atomic level. While mostly used in semiconductor technology for the deposition of ceramic oxides and nitrides…

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