28/02/2019
Welcome to a
Chemical Mechanical Planarization (CMP) Workshop
Time: Friday, March 29, 2019 at 09.30 - 16.00
Place: KTH Faculty Lounge, Electrum floor 2, Kistagången 16, Kista
We will present the CMP technology in general, and the specific applications addressed at Electrum Lab. We will also take the opportunity to present the versatility of our Chemical Mechanical Planarization tool, IPEC Avanti 472, and to invite new users.
Agenda:
09.30 Coffee
10.00 Nils Nordell (KTH): Electrum Lab and the CMP project
10.30 Corrado Capriata (KTH): The CMP technology, and the tool
11.00 Mattias Ekström (KTH): Metallization for interconnects
11.30 Per-Erik Hellström (KTH): 3D integration for CMOS nanoelectronics
12.00 Lunch sandwich
13.00 Axel Strömberg (KTH): Monolithic integration for optoelectronics
13.30 Sergey Reshanov (Ascatron): SiC planarization
14.00 Frank Niklaus (KTH): Heterogeneous integration for system on chip
14.30 Nils Nordell (KTH): Discussion, conclusive remarks,
15.00 Corrado, Nils, Per-Erik et. al: Lab visit
Registration:
Latest on March 22, to [email protected]; state your name and affiliation.
The workshop is free of charge, but a no-show fee of 400 SEK applies.